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Title: Ellipsometry Srms For Use In Thin Film Measurements
Author: D. Chandler-Horowitz, J.F. Marchiando, B.J. Belzer
Source: 1990 Measurement Science Conference
Year Published: 1990
Abstract: A Standard Reference Material (SRM) consisting of a film of silicon dioxide on a silicon substrate has been designed, fabricated, measured, and certified at NIST for the ellipsometric angles, A and 111, and for the derived flm thickness and refractive index. This SRM can be used as an aid in the evaluation of the performance of optical and mechanical thickness-monitoring instruments as well as ellipsometers. The optical instruments are based on the theory describing reflection of light from a sample. The flm thickness is determined by using a model having one or two uniform isotropic films atop a substrate. The calculated thicknesses rely on accurate values of the indices of refraction of the substrate and/or film at the necessary frequencies of light. The measurement procedure used here to certify the ellipsometric angles utilizes an accurate rotating-analyzer ellipsometer and HeNe laser source operating near the principal angle of incidence. The measurement data from several samples are analyzed collectively to determine the certified film thicknesses and refractive index At the present time, three differem film thicknesses, 50, 100, and 200 nm, are being certified. Future work may involve certifying thinner layers of oxide.

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