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Title: Submicrometer Optical And Sem Linewidth Metrology*
Author: Robert D. Larrabee
Source: 1987 Measurement Science Conference
Year Published: 1987
Abstract: The feature sizes on modern integrated circuits are presently taxing the ability of,visiblelight optical systems to perform the necessary dimensional measurements required during their production. With the shrinking of feature dimensions to the micrometer and submicrometer level, diffraction and finite wavelength become the limitations of existing optical systems. In an effort to overcome these limitations, metrology systems based on the scanning electron microscope (SEM) h ave appeared and are often assumed to be the panacea of all the problems and the limitations of existing optical systems. In response to the application of the SEM to these problems, new optical. systems have appeared including ultraviolet and laser scanning systems.

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