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Title: A Novel Artifact For Testing Large Coordinate Measuring Machines
Author: S.D. Phillips, D. Sawyer, B. Borchardt, D. Ward, D.E. Beutel
Source: 2000 Measurement Science Conference
Year Published: 2000
Abstract: We present a high accuracy artifact useful for the evaluation of large CMMs. This artifact can be physically probed by the CMM in contrast to conventional techniques that use purely optical methods such as laser interferometers. The system can be used over large distances, e.g. over four meters, with an uncertainty of less than one part per million. The artifact is relatively inexpensive, robust for use in reasonable industrial environments, and significantly reduces testing time over traditional step gauge measurements.

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