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Title: Automated Techniques For Characterizing And Displaying Ic Photomasking Variations
Author: F. E. Wahl, T. F. Hasan, S. W. Mylroie, D. S. Perloff
Source: 1979 Measurement Science Conference
Year Published: 1979
Abstract: The fabrication of complex integrated circuits involves the use of photolithographic and etching techniques for patterning semiconductor wafers. In addition, the features delineated by successive masking steps must be carefully aligned to those introduced in earlier operations. This paper describes a series of automated electrical and optical measurement techniques for evaluating and controlling dimensional variations, etching uniformity, and alignment accuracy across a wafer. Data are collected at 118 uniformly distributed test sites and displayed in the form of easily interpreted two-dimensional maps. This approach provides a comprehensive set of tools for process development, engineering studies and quality control.

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